| Author: |
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Chris A. Mack
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| Title: |
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Field Guide to Optical Lithography (SPIE Vol. FG06) (Field Guide) |
| Moochable copies: |
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No copies available |
| Amazon suggests: |
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| Recommended: |
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| Topics: |
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| Published in: |
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English |
| Binding: |
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Spiral-bound |
| Pages: |
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136 |
| Date: |
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2006-01-24 |
| ISBN: |
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0819462071 |
| Publisher: |
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SPIE Publications |
| Weight: |
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0.35 pounds |
| Size: |
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1.31 x x 1.93 centimeters |
| Edition: |
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illustrated edition |
Amazon prices: |
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| Previous givers: |
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1 AC (USA: CA) |
| Previous moochers: |
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1 will2-for (USA: CA) |
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| Description: |
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Product Description
The material in this Field Guide is a distillation of material put together by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. This Field Guide details the lithography process, image formation, imaging onto a photoresist, photoresist chemistry, and lithography control and optimization. An introduction to next-generation lithographic technologies is also included, as well as an extensive lithography glossary and a summation of salient equations critical to anyone involved in the lithography industry. Contents - Symbol Glossary
- The Lithgraphy Process
- Image Formation
- Imaging into a Photoresist
- Photoresist Chemistry
- Lithography Control and Optimization
- Equation Summary
- Glossary
- Index
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| URL: |
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http://bookmooch.com/0819462071 |
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